The Eclipse Mk-IV is the Ultimate PVD tool to support you with the following Integrated Applications –

– Interconnects

– Barriers

– Resistors and Conductors

– Packaging, C-4 and Backside

– GaAs Application

– Inkjet Application

 

Eclipse Mk-IV PVD System Overview

– Lowest Cost Of Ownership

– Highest Throughput

– High Yield Vertical Sputtering

– Vacuum Isolated Process Chambers

– Superior Process Control

– Very High Reliability

 

Eclipse Mk-IV wafer handling system

– An Atmospheric laminar flow enclosure

– Ergonomic Rotating Cassette Nests

– Optical Wafer Mapping System

– Non Edge contact Optical Pre-Aligner

– Dedicated Pre Process Cassettes

– High Speed Serial Indexed Wafer Transport

– Precision Index Wheel Positioning

 

Eclipse Mk-IV ICP Pre-Clean module

– High Density Plasma coupled to RF Bias source

– Independent control of RF and ICP power

– High Etching rate

– Less then 10% 1 Sigma Wafer to Wafer Uniformity

– Optional Turbo Pump

– Optional Multiple Gas Input Lines

 

Eclipse Mk-IV Sput Process Module

– Solid Aluminum one piece Sput Pod

– Ultra High Vacuum

– Four Identically sized Vacuum Isolated Process Chambers.

– Standard Mid-Pod Gas Injection

– Optional High Temperature Dual Zone Backplane

– Optional RF Bias

– High Conductance Chamber Design

 

The Eclipse Mk-IV comes with Clamp Ring wafer holders specially designed for Round Backplanes which reduces         Secondary Plasma’s.

 

The Eclipse Mk-IV comes with Quick target change kit

– Replace targets on the system. No need to remove cathode out of system.

– Permanently Mounted

– Faster Target Changes

– Reduces Safety Incidents

 

For inquiries, please contact our Sales Group at: Sales@guycs.com